Advanced Energy Releases Remote Plasma Source Products

Date
12/10/2020

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This new line of Remote Plasma Sources delivers reliable performance at a broad range of flow rates, increasing productivity in semiconductor process equipment

Advanced Energy announced the launch of its new MAXstream remote plasma source (RPS) product line for plasma cleaning of process chambers used in semiconductor device manufacturing. With offerings available across a broad operating range, the MAXstream line delivers higher power accuracy, best-in-class plasma ignition and increased reliability, making it the most capable RPS solution in the market.

MAXstream delivers substantial improvements over competitors’ RPS solutions. Its dual ignition core design delivers best-in-class plasma ignition reliability. The reliable and strike-every-time ignition means more consistent operation and less downtime. MAXstream also leverages AE’s proven and differentiated plasma source materials and technology to ensure long chamber life and low particle generation.

AE’s MAXstream RPS products facilitate drop-in compatibility with existing RPS systems to enable simple design-in compatibility as well as seamless field upgrades. By replacing an underperforming RPS with MAXstream, customers improve equipment productivity and gain higher performance reliability. They also gain access to AE’s best-in-class global service and support, with over a dozen service centers and worldwide field service and applications support.

The MAXstream line consists of RPS systems with gas flow of 3, 6, 8, 10, and 12 liters per minute (MAXstream 300, 600, 800, 1000, and 1200, respectively), enabling customers to optimize price and performance for their specific process. The MAXstream 300 is designed for lower flow applications (up to 3 liters per minute of cleaning gas) and has a smaller form factor than the other higher flow models.

For detailed technical specifications, visit the MAXstream product page.

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